Gallium fluoride include gallium(III) fluoride anhydrous and gallium(III) fluoride trihydrate, which is minor metal fluoride. GaF3 is colorless needle-like crystal powder, which is stable in air. Gallium metal or gallium oxide is the raw material.
Gallium Fluoride
CAS No.:7783-51-9 | EC No.:232-004-5 | Molecular Formula:GaF3 | Molecular Weight:126.72 |
Density:4.47 | Melting Point:950℃ | Boiling Point:1000℃ | Flash Point:1000℃ |
Critical Quality Parameters
For industrial and research applications, stringent quality control is paramount. Key specifications include:
1.Purity (% GaF3): High-purity grades (99.9%, 99.99%, 99.999% / 3N, 4N , 5N) are essential for electronics and optics. Purity is determined by techniques like ICP-OES or ICP-MS.
2.Trace Metal Impurities: Strict limits on contaminants like Fe, Cu, Ni, Cr, Zn, Na, K, Ca, Mg, Pb, especially crucial for semiconductor applications. Levels often specified in ppm (parts per million)
3.Moisture Content (LOI – Loss on Ignition) : Particularly important for anhydrous grades. Low LOI (<0.1% or <0.5%) indicates effective dehydration and minimizes hydrolysis risks.
4.Phase Composition: Confirmation of anhydrous form vs. trihydrate form ( via XRD – X-Ray diffraction or TGA – Thermogravimetric Analysis). Control over crystal structure.
5.Particle size Distribution: Specified as mesh size (e.g., -100mesh , -325mesh) or D50 value (e.g., <10μm, 1-5μm). Critical for consistent processing (e.g., thin film deposition, ceramic sintering).
6. Anion Content: Control of residual chlorides (Cl–), sulfate (SO42-), nitrates (NO3–).
Diverse Applications Leveraging GaF3 Properties
Gallium Fluorides’s unqiue combination of high thermal stability, wide bandgap, low phonon energy, and specific optical properties makes it invaluable in several cutting-edge fields.
1.Optical materials & coatings:
- UV optics: Used in the synthesis of fluoride glasses (e.g., ZBLAN-ZrF4-BaF2–LaF3-AlF3-NaF) doped with rare earths for fiber optics operating in the ultraviolet to mid-infrared range, benefiting from GaF3‘s low phonon energy which minimizes non-radiative decay.
- Anti-Reflective (AR) coatings: Thin films of GaF3 are deposited (e.g., via evaporation or sputtering ) onto lenses, windows, and optical ccomponents, particularly in the UV spectrum, due to its favorable refractive index and transparency.
- Luminescent Materials: Acts as a host matrix or co-dopant in phosphors for specialized lighting, displays, or scintillators.
2. Electronics & Semiconductors:
- Dopant Source: Used in ion implantation proceses for doping semiconductor materials (e.g., silicon carbide -SiC) with gallium ions to create p-type regions.
- Gate Dielectrics: Investigated as a high-k dielectric material ( due to its relatively high dielectric constant compared to SiO2) for potentional use in future transistor technologies.
- Catalyst in Electronics Manufacturing: Plays a role in specific chemical vapor deposition (CVD) or etching processes for semiconductor devices.
3. Catalysis:
- Fluorination Catalyst: Used as a catalyst or catalyst support in organic synthesis reactions involving fluorination, such as the synthesis of hydrofluoroolefins (HFOs), which are next-generation refrigerants replacing HFCs.
- Isomerization & Alkylation: Active in certain hydrocarbon isomerization and alkylation reactions within the petrochemical industry.
4. Specialty Ceramics & Glasses:
- Component in Advanced Ceramics: Incorporated into specific ceramic formulations to modify properties like sintering behavior, thermal expansion, or chemical resistance.
- Glass Modification: Used as an additive in specialty glass melts to alter optical or chemical properties.
5. Research & Development:
- Synthesis Precursor: Serves as a starting material for synthesizing other gallium compounds, complexes, and nanomaterials.
- Material Science Studies: Investigated for novel properties in areas like magnetism, superconductivity, and solid-state ionics.
handling & Safety
- Toxicity: Gallium copmounds are generaally considered to have low to moderate toxicity, but specific toxicological data on GaF3 should be consulted. Fluoride ions can be toxic if ingested or inhaled in significant quantities.
- Corrosivity: Reacts with strong acids and strong bases. Can release HF (highly corrosive and toxic) if heated strongly, dissolved in hot water, or exposed to strong acids.
- Personal Protective Equipment (PPE): Use chemical safety goggles, golves (nitrile or neoprene recommended), and lab coat. Use in a well-ventilated area or fume hood, especially when handling powder to avoid inhalation. Respiratory protection ( dust mask aor respirator) may be necessary for fin powders.
- Storage: Store in a cool, dry , well-ventilated place in tightly sealed containers. Keep away from moisture, strong acids, and strong bases. Separate from incompatible materials.
- First Aid: In case of skin contact, wash thoroughly with soap and water. For eye contact, flush immediately with plenty of water for at least 15 minutes and seek medical attention. If inhaled, move to fresh air. If sallowed, do NOT induce vomiting; rinse mouth and seek medical advice immediately. Always consult the specific Safety Data Sheet (SDS) for detailed handling and emergency procedures.
Why Choose High-Quality Gallium Fluoride
Investing in rigorously controlled GaF3 is critical. HIgh purity ensures predictable performance, minimizes unwanted side reactions in synthesis or catalysis, prevents contamination in semiconductor processes, and guarantees the optical clarity required for advanced lenses and fibers. Consistent particle size enables uniform thin films and realiable sintering in ceramics. Precise phase control (anhydrous vs. trihydrate is fundamental for proceses sensitive to water ocontent.
In summary, Gallium Fluoride (GaF3) is far more than just a simple chemical. Its exceptional thermal and optical properties, coupled with its role in elecronics and catalysis, make it a vital advanced material. Supplying consistently high-purity GaF3 with well-defined specifications is essential for enabling innovation across optics, electronics, catalysis, and materials science.